| Abstract: | I will present our recent results for Molecular Layer Deposition (MLD) approach for the formation of organic-inorganic metal oxides with controllable properties. The hybrid MLD films can be formed on macroscopic surfaces as well as on nanostructures such as nanoparticles and nanowires with high geometrical aspect ratio. Our results present a significant advance for formation of highly controlled and photocatalytic films on high aspect ratio nanometric scaffolds and templates, together with high molecular permeability, or porosity and preferably without the use of surfactants. Thus, MLD combines the highly controllable characteristics of ALD enabling high quality, conformal, films readily formed by this method and unique tunability. |
